Performance characterization of an xy-stage applied to micrometric laser direct writing lithography

278

Autores:: Jaramillo J.
Zarzycki A.
Galeano J.
Sandoz P.

Tipo de recurso:

Fecha de publicación:: 2017

Institución:: Instituto Tecnológico Metropolitano

Repositorio:: Repositorio ITM

Idioma:

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spelling	Jaramillo J.Zarzycki A.Galeano J.Sandoz P.2020-08-28T22:28:08Z2020-08-28T22:28:08Z2017http://hdl.handle.net/20.500.12622/347910.3390/s17020278Scopushttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85011662546&doi=10.3390%2fs17020278&partnerID=40&md5=5096edbe32fc296b8b8268928bae6cafPerformance characterization of an xy-stage applied to micrometric laser direct writing lithographySensors (Switzerland)info:eu-repo/semantics/articlehttp://purl.org/coar/version/c_970fb48d4fbd8a85http://purl.org/coar/resource_type/c_2df8fbb1217278http://purl.org/coar/access_right/c_14cbPublication20.500.12622/3479oai:dspace-itm.metabuscador.org:20.500.12622/34792025-06-20 16:15:56.417metadata.onlyhttps://dspace-itm.metabuscador.orgRepositorio Instituto Tecnológico Metropolitano de Medellínbdigital@metabiblioteca.com
dc.title.spa.fl_str_mv	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
dc.title.alternative.none.fl_str_mv	Sensors (Switzerland)
title	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
spellingShingle	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
title_short	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
title_full	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
title_fullStr	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
title_full_unstemmed	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
title_sort	Performance characterization of an xy-stage applied to micrometric laser direct writing lithography
dc.creator.fl_str_mv	Jaramillo J. Zarzycki A. Galeano J. Sandoz P.
dc.contributor.author.none.fl_str_mv	Jaramillo J. Zarzycki A. Galeano J. Sandoz P.
description	278
publishDate	2017
dc.date.issued.none.fl_str_mv	2017
dc.date.accessioned.none.fl_str_mv	2020-08-28T22:28:08Z
dc.date.available.none.fl_str_mv	2020-08-28T22:28:08Z
dc.type.none.fl_str_mv	info:eu-repo/semantics/article
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dc.identifier.doi.none.fl_str_mv	10.3390/s17020278
url	http://hdl.handle.net/20.500.12622/3479
identifier_str_mv	10.3390/s17020278
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dc.relation.citationvolume.none.fl_str_mv	17
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dc.source.none.fl_str_mv	Scopus
institution	Instituto Tecnológico Metropolitano
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repository.name.fl_str_mv	Repositorio Instituto Tecnológico Metropolitano de Medellín
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Performance characterization of an xy-stage applied to micrometric laser direct writing lithography

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