Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo

ilustraciones

Autores:: Prieto Novoa, Gina Milena

Tipo de recurso:

Fecha de publicación:: 2021

Institución:: Universidad Nacional de Colombia

Repositorio:: Universidad Nacional de Colombia

Idioma:: spa

id	UNACIONAL2_122832d0f257968b830d533533b5bd76
oai_identifier_str	oai:repositorio.unal.edu.co:unal/79689
network_acronym_str	UNACIONAL2
network_name_str	Universidad Nacional de Colombia
repository_id_str
dc.title.spa.fl_str_mv	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
dc.title.translated.eng.fl_str_mv	Study of the optical and electrical properties of TiAlCrN thin films deposited by reactive “co-sputtering”.
title	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
spellingShingle	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo 530 - Física::537 - Electricidad y electrónica Propiedades ópticas Optical properties TiAlCrN Resistividad eléctrica Propiedades ópticas "Co-sputtering" Electrical resistivity Optical properties TiAlCrN "Co-sputtering" Propiedad eléctrica Electrical properties
title_short	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
title_full	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
title_fullStr	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
title_full_unstemmed	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
title_sort	Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo
dc.creator.fl_str_mv	Prieto Novoa, Gina Milena
dc.contributor.advisor.none.fl_str_mv	Piamba Tulcán, Oscar Edwin Olaya Flórez, Jhon Jairo
dc.contributor.author.none.fl_str_mv	Prieto Novoa, Gina Milena
dc.contributor.researchgroup.spa.fl_str_mv	GRUPO DE INVESTIGACIÓN AFIS (ANÁLISIS DE FALLAS, INTEGRIDAD Y SUPERFICIES)
dc.subject.ddc.spa.fl_str_mv	530 - Física::537 - Electricidad y electrónica
topic	530 - Física::537 - Electricidad y electrónica Propiedades ópticas Optical properties TiAlCrN Resistividad eléctrica Propiedades ópticas "Co-sputtering" Electrical resistivity Optical properties TiAlCrN "Co-sputtering" Propiedad eléctrica Electrical properties
dc.subject.other.none.fl_str_mv	Propiedades ópticas Optical properties
dc.subject.proposal.spa.fl_str_mv	TiAlCrN Resistividad eléctrica Propiedades ópticas "Co-sputtering"
dc.subject.proposal.eng.fl_str_mv	Electrical resistivity Optical properties TiAlCrN "Co-sputtering"
dc.subject.unesco.none.fl_str_mv	Propiedad eléctrica Electrical properties
description	ilustraciones
publishDate	2021
dc.date.accessioned.none.fl_str_mv	2021-06-23T17:56:09Z
dc.date.available.none.fl_str_mv	2021-06-23T17:56:09Z
dc.date.issued.none.fl_str_mv	2021
dc.type.spa.fl_str_mv	Trabajo de grado - Maestría
dc.type.driver.spa.fl_str_mv	info:eu-repo/semantics/masterThesis
dc.type.version.spa.fl_str_mv	info:eu-repo/semantics/acceptedVersion
dc.type.content.spa.fl_str_mv	Text
dc.type.redcol.spa.fl_str_mv	http://purl.org/redcol/resource_type/TM
status_str	acceptedVersion
dc.identifier.uri.none.fl_str_mv	https://repositorio.unal.edu.co/handle/unal/79689
dc.identifier.instname.spa.fl_str_mv	Universidad Nacional de Colombia
dc.identifier.reponame.spa.fl_str_mv	Repositorio Institucional Universidad Nacional de Colombia
dc.identifier.repourl.spa.fl_str_mv	https://repositorio.unal.edu.co/
url	https://repositorio.unal.edu.co/handle/unal/79689 https://repositorio.unal.edu.co/
identifier_str_mv	Universidad Nacional de Colombia Repositorio Institucional Universidad Nacional de Colombia
dc.language.iso.spa.fl_str_mv	spa
language	spa
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dc.publisher.spa.fl_str_mv	Universidad Nacional de Colombia
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bitstream.url.fl_str_mv	https://repositorio.unal.edu.co/bitstream/unal/79689/1/license.txt https://repositorio.unal.edu.co/bitstream/unal/79689/2/1020756588-2021.pdf https://repositorio.unal.edu.co/bitstream/unal/79689/3/1020756588-2021.pdf.jpg
bitstream.checksum.fl_str_mv	cccfe52f796b7c63423298c2d3365fc6 e4b17f62d08396d482d72132d599ba94 817eb93078e41e3a4c389f875091dbda
bitstream.checksumAlgorithm.fl_str_mv	MD5 MD5 MD5
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_version_	1814090171018117120
spelling	Atribución-NoComercial-SinDerivadas 4.0 InternacionalDerechos Reservados al Autor, 2021http://creativecommons.org/licenses/by-nc-nd/4.0/info:eu-repo/semantics/openAccesshttp://purl.org/coar/access_right/c_abf2Piamba Tulcán, Oscar Edwin033a75a569122c165a4115dc829748eaOlaya Flórez, Jhon Jairo6742336e78cba204f151e59d8e612f56Prieto Novoa, Gina Milena691e0484e1fcd9d922dd51effeac6f2aGRUPO DE INVESTIGACIÓN AFIS (ANÁLISIS DE FALLAS, INTEGRIDAD Y SUPERFICIES)2021-06-23T17:56:09Z2021-06-23T17:56:09Z2021https://repositorio.unal.edu.co/handle/unal/79689Universidad Nacional de ColombiaRepositorio Institucional Universidad Nacional de Colombiahttps://repositorio.unal.edu.co/ilustracionesEn la presente investigación se estudiaron las propiedades eléctricas y ópticas de recubrimientos de TiAlCrN con diferentes concentraciones de Cr y espesores aproximados de 222±25 nm y 1040±40 nm. Los recubrimientos se depositaron sobre sustratos de vidrio mediante la técnica de “co-sputtering” reactivo empleando blancos de TiAl y Cr, variando la potencia aplicada al blanco de Cr entre 0-170W. La composición química elemental, microestructura, morfología superficial y rugosidad fueron evaluadas mediante espectrofotometría electrónica Auger (AES, por sus siglas en inglés), difracción de rayos X (XRD, por sus siglas en inglés), microscopía electrónica de barrido (SEM, por sus siglas en inglés) y perfilometría mecánica. La resistividad eléctrica se midió mediante el método de cuatro puntas y sus propiedades ópticas se caracterizaron por espectrofotometría UV- Vis-NIR. De acuerdo con los resultados obtenidos, se observó que la concentración de Cr en el recubrimiento influye sobre la composición química, microestructura y morfología, incidiendo en las propiedades eléctricas y ópticas de los recubrimientos de TiAlCrN. Con una variación de Cr entre el 0 at% y 12 at% se presentó una transición de fases desde una estructura monofásica hexagonal tipo wurtzita hasta una estructura monofásica cúbica tipo NaCl, pasando por una estructura bifásica hexagonal/cúbica. Igualmente, la adición de Cr aumentó el tamaño de cristalito y con este la rugosidad de los recubrimientos. Los recubrimientos presentaron un comportamiento óhmico a temperatura ambiente y exhibieron resistividades eléctricas superficiales dentro del rango de los semiconductores. La adición de Cr permitió disminuir esta resistividad de 490,1±43,4 Ωcm a 1,5±0,1 Ωcm. Respecto a las propiedades ópticas, estos se caracterizaron por exhibir una baja reflectancia, la cual no superó el 1,5 % en todo el rango del espectro estudiado y una alta absorción en la región UV, la cual disminuye para longitudes de ondas mayores. El aumento de la concentración de cromo disminuyó la energía de la brecha prohibida óptica (Gap óptico) de 2,9 eV a 2,3 eV, disminuyó la transmitancia, aumentó la absorción y no afectó la reflectancia de los recubrimientos en el rango de longitudes de onda evaluado. Mediante el método de Bhattacharyya calculó el índice de refracción (n) y coeficiente extinción (k) a partir del espectro de transmitancia. (Texto tomado de la fuente)This research work develops a study of the electrical and optical properties of TiAlCrN coatings with different Cr concentrations and thicknesses of 222±25 nm and 1040±40 nm. The coatings were deposited on glass substrates by reactive co-sputtering technique using TiAl and Cr targets, varying the power applied to the Cr target between 0W to 170W. Elemental chemical composition, microstructure, surface morphology and roughness were evaluated by Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscopy (SEM) and mechanical profilometry, respectively. The electrical resistivity was measured by the four-prong method and their optical properties were characterized by UV-Vis-NIR spectrophotometry. According to the results obtained, it was observed that the Cr concentration in the coating influences the chemical composition, microstructure, and morphology, affecting the electrical and optical properties of the TiAlCrN coatings. With a Cr variation between 0 at% and 21 at%, a phase transition from a single-phase hexagonal wurtzite-type structure to a single-phase cubic NaCl-type structure, passing through a two-phase hexagonal/cubic structure was presented. Likewise, the addition of Cr increased the crystallite size and with it the roughness of the coatings, the crystallite size varied between 30nm-46nm and 27nm- 66nm for the thinner and thicker coatings, respectively. The coatings showed an ohmic behavior at room temperature and exhibited surface electrical resistivities within the semiconductor range. The addition of Cr allowed decreasing this resistivity from 490.1±43.4 Ωcm to 1.5±0.1 Ωcm. Regarding the optical properties, the coatings exhibited low reflectance, which did not exceed 1.5 % in the whole range of the spectrum studied, and showed a high absorption in the UV region, which decreases for longer wavelengths. The addition of chromium decreased the optical Gap from 2.9 eV to 2.3 eV, decreased the transmittance, increased the absorption, and did not affect the reflectance of the coatings in the wavelength range evaluated. The refractive index (n) and extinction coefficient (k) were calculated using the Bhattacharyya method from the transmittance spectrum. (Texto tomado de la fuente)MaestríaMagíster en Ingeniería - Materiales y ProcesosMateriales nanoestructuradosIngeniería de Superficies126 páginasapplication/pdfspaUniversidad Nacional de ColombiaBogotá - Ingeniería - Maestría en Ingeniería - Materiales y ProcesosDepartamento de Ingeniería Mecánica y MecatrónicaFacultad de IngenieríaBogotá, ColombiaUniversidad Nacional de Colombia - Sede Bogotá530 - Física::537 - Electricidad y electrónicaPropiedades ópticasOptical propertiesTiAlCrNResistividad eléctricaPropiedades ópticas"Co-sputtering"Electrical resistivityOptical propertiesTiAlCrN"Co-sputtering"Propiedad eléctricaElectrical propertiesEstudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivoStudy of the optical and electrical properties of TiAlCrN thin films deposited by reactive “co-sputtering”.Trabajo de grado - Maestríainfo:eu-repo/semantics/masterThesisinfo:eu-repo/semantics/acceptedVersionTexthttp://purl.org/redcol/resource_type/TMH. 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Cells, vol. 92, pp. 1425–1433, 2008.GeneralLICENSElicense.txtlicense.txttext/plain; charset=utf-83964https://repositorio.unal.edu.co/bitstream/unal/79689/1/license.txtcccfe52f796b7c63423298c2d3365fc6MD51ORIGINAL1020756588-2021.pdf1020756588-2021.pdfTesis de Maestría en Ingeniería - Materiales y Procesosapplication/pdf2452735https://repositorio.unal.edu.co/bitstream/unal/79689/2/1020756588-2021.pdfe4b17f62d08396d482d72132d599ba94MD52THUMBNAIL1020756588-2021.pdf.jpg1020756588-2021.pdf.jpgGenerated Thumbnailimage/jpeg5743https://repositorio.unal.edu.co/bitstream/unal/79689/3/1020756588-2021.pdf.jpg817eb93078e41e3a4c389f875091dbdaMD53unal/79689oai:repositorio.unal.edu.co:unal/796892024-07-23 23:33:27.024Repositorio Institucional Universidad Nacional de Colombiarepositorio_nal@unal.edu.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

Estudio de las propiedades ópticas y eléctricas de películas delgadas de TiAlCrN depositadas por “co- sputtering” reactivo

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