Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO

ABSTRACT: The doping response of the prototypical transparent oxides NiO (p-type), ZnO (n-type), and MgO (insulating) is caused by spontaneous formation of compensating centers, leading to Fermi-level pinning at critical Fermi energies. We study the doping principles in these oxides by first-princip...

Full description

Autores:
Lany, Stephan
Osorio Guillén, Jorge Mario
Zunger, Alex
Tipo de recurso:
Article of investigation
Fecha de publicación:
2007
Institución:
Universidad de Antioquia
Repositorio:
Repositorio UdeA
Idioma:
eng
OAI Identifier:
oai:bibliotecadigital.udea.edu.co:10495/8384
Acceso en línea:
http://hdl.handle.net/10495/8384
Palabra clave:
Electrones
Electrons
Ionización
Ionization
Óxidos
Oxides
Cationes
Cations
Semiconductores
Semiconductors
Niveles de Fermi
Rights
openAccess
License
https://creativecommons.org/licenses/by-nc-nd/4.0/
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network_acronym_str UDEA2
network_name_str Repositorio UdeA
repository_id_str
dc.title.spa.fl_str_mv Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
title Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
spellingShingle Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
Electrones
Electrons
Ionización
Ionization
Óxidos
Oxides
Cationes
Cations
Semiconductores
Semiconductors
Niveles de Fermi
title_short Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
title_full Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
title_fullStr Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
title_full_unstemmed Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
title_sort Origins of the doping asymmetry in oxides : hole doping in NiO versus electron doping in ZnO
dc.creator.fl_str_mv Lany, Stephan
Osorio Guillén, Jorge Mario
Zunger, Alex
dc.contributor.author.none.fl_str_mv Lany, Stephan
Osorio Guillén, Jorge Mario
Zunger, Alex
dc.contributor.researchgroup.spa.fl_str_mv Ciencia de los Materiales
dc.subject.decs.none.fl_str_mv Electrones
Electrons
topic Electrones
Electrons
Ionización
Ionization
Óxidos
Oxides
Cationes
Cations
Semiconductores
Semiconductors
Niveles de Fermi
dc.subject.lemb.none.fl_str_mv Ionización
Ionization
Óxidos
Oxides
Cationes
Cations
Semiconductores
Semiconductors
dc.subject.proposal.spa.fl_str_mv Niveles de Fermi
description ABSTRACT: The doping response of the prototypical transparent oxides NiO (p-type), ZnO (n-type), and MgO (insulating) is caused by spontaneous formation of compensating centers, leading to Fermi-level pinning at critical Fermi energies. We study the doping principles in these oxides by first-principles calculations of carrier-producing or-compensating defects and of the natural band offsets, and identify the dopability trends with the ionization potentials and electron affinities of the oxides. We find that the room-temperature free-hole density of cation-deficient NiO is limited by a too large ionization energy of the Ni vacancy, but it can be strongly increased by extrinsic dopants with shallower acceptor levels.
publishDate 2007
dc.date.issued.none.fl_str_mv 2007
dc.date.accessioned.none.fl_str_mv 2017-09-27T22:17:31Z
dc.date.available.none.fl_str_mv 2017-09-27T22:17:31Z
dc.type.spa.fl_str_mv Artículo de investigación
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dc.identifier.citation.spa.fl_str_mv Lany, S., Osorio Guillén, J. M., & Zunger, A. (2007). Origins of the doping asymmetry in oxides: Hole doping in NiO versus electron doping in ZnO. Physical Review, B: Condensed Matter, 75(241203(R)), 1-4. DOI:PhysRevB.75.241203
dc.identifier.issn.none.fl_str_mv 2469-9969
dc.identifier.uri.none.fl_str_mv http://hdl.handle.net/10495/8384
dc.identifier.doi.none.fl_str_mv 2469-9969 E
dc.identifier.eissn.none.fl_str_mv 2469-9950
identifier_str_mv Lany, S., Osorio Guillén, J. M., & Zunger, A. (2007). Origins of the doping asymmetry in oxides: Hole doping in NiO versus electron doping in ZnO. Physical Review, B: Condensed Matter, 75(241203(R)), 1-4. DOI:PhysRevB.75.241203
2469-9969
2469-9969 E
2469-9950
url http://hdl.handle.net/10495/8384
dc.language.iso.spa.fl_str_mv eng
language eng
dc.relation.ispartofjournalabbrev.spa.fl_str_mv Phys Rev B
dc.relation.citationendpage.spa.fl_str_mv 4
dc.relation.citationissue.spa.fl_str_mv 241203(R)
dc.relation.citationstartpage.spa.fl_str_mv 1
dc.relation.citationvolume.spa.fl_str_mv 75
dc.relation.ispartofjournal.spa.fl_str_mv Physical Review B: Condensed Matter
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dc.publisher.spa.fl_str_mv The American Physical Society
dc.publisher.place.spa.fl_str_mv Estados Unidos
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spelling Lany, StephanOsorio Guillén, Jorge MarioZunger, AlexCiencia de los Materiales2017-09-27T22:17:31Z2017-09-27T22:17:31Z2007Lany, S., Osorio Guillén, J. M., & Zunger, A. (2007). Origins of the doping asymmetry in oxides: Hole doping in NiO versus electron doping in ZnO. Physical Review, B: Condensed Matter, 75(241203(R)), 1-4. DOI:PhysRevB.75.2412032469-9969http://hdl.handle.net/10495/83842469-9969 E2469-9950ABSTRACT: The doping response of the prototypical transparent oxides NiO (p-type), ZnO (n-type), and MgO (insulating) is caused by spontaneous formation of compensating centers, leading to Fermi-level pinning at critical Fermi energies. We study the doping principles in these oxides by first-principles calculations of carrier-producing or-compensating defects and of the natural band offsets, and identify the dopability trends with the ionization potentials and electron affinities of the oxides. 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